Show simple item record

Electrical comparison of iN7 EUV hybrid and EUV single patterning BEOL metal layers

dc.contributor.authorLariviere, Stephane
dc.contributor.authorWilson, Chris
dc.contributor.authorKutrzeba Kotowska, Bogumila
dc.contributor.authorVersluijs, Janko
dc.contributor.authorDecoster, Stefan
dc.contributor.authorMao, Ming
dc.contributor.authorvan der Veen, Marleen
dc.contributor.authorJourdan, Nicolas
dc.contributor.authorEl-Mekki, Zaid
dc.contributor.authorHeylen, Nancy
dc.contributor.authorKesters, Els
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorBeral, Christophe
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorBekaert, Joost
dc.contributor.authorBlanco, Victor
dc.contributor.authorCiofi, Ivan
dc.contributor.authorWan, Danny
dc.contributor.authorBriggs, Basoene
dc.contributor.authorMallik, Arindam
dc.contributor.authorHendrickx, Eric
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.authorMcIntyre, Greg
dc.contributor.authorRonse, Kurt
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorTokei, Zsolt
dc.contributor.authorMocuta, Dan
dc.date.accessioned2021-10-25T21:32:54Z
dc.date.available2021-10-25T21:32:54Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31120
dc.sourceIIOimport
dc.titleElectrical comparison of iN7 EUV hybrid and EUV single patterning BEOL metal layers
dc.typeProceedings paper
dc.contributor.imecauthorLariviere, Stephane
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorKutrzeba Kotowska, Bogumila
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorDecoster, Stefan
dc.contributor.imecauthorMao, Ming
dc.contributor.imecauthorvan der Veen, Marleen
dc.contributor.imecauthorJourdan, Nicolas
dc.contributor.imecauthorEl-Mekki, Zaid
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorBeral, Christophe
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorWan, Danny
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorMallik, Arindam
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecDecoster, Stefan::0000-0003-1162-9288
dc.contributor.orcidimecvan der Veen, Marleen::0000-0002-9402-8922
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecWan, Danny::0000-0003-4847-3184
dc.contributor.orcidimecMallik, Arindam::0000-0002-0742-9366
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage105830U
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IX
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2299389
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10583


Files in this item

Thumbnail
Name:
36921.pdf
Size:
1.454Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record