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The need for LWR metrology standardization: the imec roughness protocol

dc.contributor.authorLorusso, Gian
dc.contributor.authorSutani, Takeyoshi
dc.contributor.authorRutigliani, Vito
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorMoussa, Alain
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorMack, Chris
dc.contributor.authorNaulleau, Patrick
dc.contributor.authorConstantoudis, Vassilios
dc.contributor.authorIkota, Masami
dc.contributor.authorIshimoto, Toru
dc.contributor.authorKoshihara, S
dc.date.accessioned2021-10-25T22:34:01Z
dc.date.available2021-10-25T22:34:01Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31241
dc.sourceIIOimport
dc.titleThe need for LWR metrology standardization: the imec roughness protocol
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorCharley, Anne-Laure
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage105850D
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXII
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2294617
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10585


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