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dc.contributor.authorOgawa, Yuichi
dc.contributor.authorGan, Nobuko
dc.contributor.authorMasaoka, Toru
dc.contributor.authorYoshimura, Minami
dc.contributor.authorIino, Hideaki
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKesters, Els
dc.contributor.authorAkanishi, Yuya
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-26T00:22:13Z
dc.date.available2021-10-26T00:22:13Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31442
dc.sourceIIOimport
dc.titleStudy of cobalt etch control by pH and oxidizer
dc.typeMeeting abstract
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorAkanishi, Yuya
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.source.peerreviewyes
dc.source.conferenceSurface Preparation and Cleaning Conference - SPCC
dc.source.conferencedate9/04/2018
dc.source.conferencelocationBoston, MA USA
dc.identifier.urlhttps://linxconferences.com/spcc-2018-technical-program/
imec.availabilityPublished - imec


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