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RMG patterning by digital wet etching of polycrystalline metal films

dc.contributor.authorOniki, Yusuke
dc.contributor.authorVereecke, Guy
dc.contributor.authorDentoni Litta, Eugenio
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorDekkers, Harold
dc.contributor.authorSchram, Tom
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorHoriguchi, Naoto
dc.date.accessioned2021-10-26T00:25:09Z
dc.date.available2021-10-26T00:25:09Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31447
dc.sourceIIOimport
dc.titleRMG patterning by digital wet etching of polycrystalline metal films
dc.typeProceedings paper
dc.contributor.imecauthorOniki, Yusuke
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorDentoni Litta, Eugenio
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecOniki, Yusuke::0000-0002-6619-1327
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.source.peerreviewyes
dc.source.beginpage132
dc.source.endpage140
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIV - UCPSS
dc.source.conferencedate2/09/2018
dc.source.conferencelocationLeuven belgium
dc.identifier.urlhttps://www.scientific.net/SSP.282.132
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol. 282


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