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Selective wet removal of the SiN contact etch stop layer prior to S/D contact formation

dc.contributor.authorPacco, Antoine
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorSchaekers, Marc
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorDictus, Dries
dc.contributor.authorCuypers, Daniel
dc.date.accessioned2021-10-26T00:37:16Z
dc.date.available2021-10-26T00:37:16Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31468
dc.sourceIIOimport
dc.titleSelective wet removal of the SiN contact etch stop layer prior to S/D contact formation
dc.typeProceedings paper
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorDictus, Dries
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecDictus, Dries::0000-0002-7896-1747
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferenceThe Surface Preparation and Cleaning Conference - SPCC
dc.source.conferencedate9/04/2018
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - open access


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