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Acidic cleaning solutions for post InGaAs CMP cleaning

dc.contributor.authorPark, Jin-Goo
dc.contributor.authorPurushothaman, Muthukrishnan
dc.contributor.authorLee, Jung-Hwan
dc.contributor.authorChoi, In-chan
dc.contributor.authorKim, Hyun-Tae
dc.contributor.authorTeugels, Lieve
dc.contributor.authorKim, Tae-Gon
dc.date.accessioned2021-10-26T00:49:43Z
dc.date.available2021-10-26T00:49:43Z
dc.date.issued2018-04
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31489
dc.sourceIIOimport
dc.titleAcidic cleaning solutions for post InGaAs CMP cleaning
dc.typeProceedings paper
dc.contributor.imecauthorTeugels, Lieve
dc.contributor.orcidimecTeugels, Lieve::0000-0002-6613-9414
dc.source.peerreviewyes
dc.source.conference20th Surface Preparation and Cleaning Conference - SPCC 2018
dc.source.conferencedate9/04/2018
dc.source.conferencelocationCambridge, MA USA
imec.availabilityPublished - imec


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