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Wet-chemical etching of ruthenium in acidic Ce4+ solution

dc.contributor.authorPhilipsen, Harold
dc.contributor.authorTeck, Sander
dc.contributor.authorMouwen, Nils
dc.contributor.authorMonnens, Wouter
dc.contributor.authorLe, Quoc Toan
dc.date.accessioned2021-10-26T01:11:27Z
dc.date.available2021-10-26T01:11:27Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31526
dc.sourceIIOimport
dc.titleWet-chemical etching of ruthenium in acidic Ce4+ solution
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Harold
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.orcidimecPhilipsen, Harold::0000-0002-5029-1104
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.source.peerreviewyes
dc.source.beginpage284
dc.source.endpage287
dc.source.conferenceUltra Clean Processing of Semiconductor Surafces XIV - UCPSS
dc.source.conferencedate2/09/2018
dc.source.conferencelocationLeuven Belgium
dc.identifier.urlhttp://www.dx.doi.org/10.4028/www.scientific.net/SSP.282.284
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol. 282


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