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Novel EUV mask absorber evaluation in support of next-generation EUV imaging

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorLuong, Vu
dc.contributor.authorOpsomer, Karl
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorHendrickx, Eric
dc.contributor.authorErdmann, Andreas
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorvan de Kruijs, Robbert
dc.contributor.authorHeidarnia-Fathabad, Zahra
dc.contributor.authorScholze, Frank
dc.contributor.authorLaubis, Christian
dc.date.accessioned2021-10-26T01:12:07Z
dc.date.available2021-10-26T01:12:07Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31527
dc.sourceIIOimport
dc.titleNovel EUV mask absorber evaluation in support of next-generation EUV imaging
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage108100C
dc.source.conferencePhotomask Technology 2018
dc.source.conferencedate17/09/2018
dc.source.conferencelocationMonterey, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2501799
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPE; Vol. 10810


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