A new method to fabricate Ge nanowires: selective lateral etching of GeSn:P-Ge multi-stacks

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Authors
Porret, Clément; Vohra, Anurag; Sebaai, Farid; Douhard, Bastien; Hikavyy, Andriy; Loo, Roger
Conference
Ultra Clean Processing of Semiconductor Surfaces XIV
Title
A new method to fabricate Ge nanowires: selective lateral etching of GeSn:P-Ge multi-stacks
Publication type
Proceedings paper
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