The dependence of stress induced voiding on line width studied by conventional and high resolution resistance measurements

dc.contributor.author	Witvrouw, Ann
dc.contributor.author	Maex, Karen
dc.contributor.author	De Ceuninck, Ward
dc.contributor.author	Lekens, Geert
dc.contributor.author	D'Haen, Jan
dc.contributor.author	De Schepper, Luc
dc.date.accessioned	2021-10-01T09:49:04Z
dc.date.available	2021-10-01T09:49:04Z
dc.date.issued	1998
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/3158
dc.source	IIOimport
dc.title	The dependence of stress induced voiding on line width studied by conventional and high resolution resistance measurements
dc.type	Proceedings paper
dc.contributor.imecauthor	Maex, Karen
dc.contributor.imecauthor	De Ceuninck, Ward
dc.contributor.imecauthor	Lekens, Geert
dc.contributor.imecauthor	D'Haen, Jan
dc.date.embargo	9999-12-31
dc.source.peerreview	no
dc.source.beginpage	1035
dc.source.endpage	1041
dc.source.conference	Proceedings of the 9th European Symposium on Reliability of Electron Devices and Failure Physics - ESREF
dc.source.conferencelocation
imec.availability	Published - open access
imec.internalnotes	Speical issue Microelectronics Reliability 38(1998)