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Area-selective grafting of siloxane molecules on low-k dielectric with respect to copper surface

dc.contributor.authorRezvanov, Askar
dc.contributor.authorZyulkov, Ivan
dc.contributor.authorGornev, E. S.
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorArmini, Silvia
dc.date.accessioned2021-10-26T02:32:04Z
dc.date.available2021-10-26T02:32:04Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31656
dc.sourceIIOimport
dc.titleArea-selective grafting of siloxane molecules on low-k dielectric with respect to copper surface
dc.typeMeeting abstract
dc.contributor.imecauthorZyulkov, Ivan
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage02SALD
dc.source.conferenceMaterials for Advanced Metallization Conference - MAM
dc.source.conferencedate18/03/2018
dc.source.conferencelocationMilano Italy
dc.identifier.urlhttp://mam2018.mdm.imm.cnr.it/MAM2018.pdf
imec.availabilityPublished - open access


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