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Analysis of plasma induced gate oxide damage in multi-level metal processing

dc.contributor.authorYuan, Xiao Jie
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorLietaer, Nicolas
dc.contributor.authorZagrebnov, Maxim
dc.contributor.authorDebusschere, Ingrid
dc.contributor.authorDeferm, Ludo
dc.date.accessioned2021-10-01T09:51:28Z
dc.date.available2021-10-01T09:51:28Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3166
dc.sourceIIOimport
dc.titleAnalysis of plasma induced gate oxide damage in multi-level metal processing
dc.typeProceedings paper
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorDebusschere, Ingrid
dc.contributor.imecauthorDeferm, Ludo
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage405
dc.source.endpage409
dc.source.conferenceProceedings 15th International VLSI Multilevel Interconnection Conference - VMIC
dc.source.conferencedate16/06/1998
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access


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