dc.contributor.author | Zhang, Fenghong | |
dc.contributor.author | Op de Beeck, Maaike | |
dc.contributor.author | Ronse, Kurt | |
dc.contributor.author | Gangala, Hareen K | |
dc.contributor.author | Gopalan, P. | |
dc.contributor.author | Conley, P. | |
dc.contributor.author | Dusa, M. | |
dc.contributor.author | Bendik, Joe | |
dc.date.accessioned | 2021-10-01T09:52:04Z | |
dc.date.available | 2021-10-01T09:52:04Z | |
dc.date.issued | 1998 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3168 | |
dc.source | IIOimport | |
dc.title | CD control using SiON BARL processing for sub 0.25µm lithography | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Op de Beeck, Maaike | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.orcidimec | Op de Beeck, Maaike::0000-0002-2700-6432 | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.source.peerreview | no | |
dc.source.conference | MNE 98 - Micro- and Nano-Engineering Conference; 22-24 Sept. 1998; Leuven, Belgium. | |
dc.source.conferencelocation | | |
imec.availability | Published - imec | |