Track height reduction for standard-cell in below 5nm node: How low can you go?

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Authors
Sherazi, Yasser; Chae, Jung Kyu; Debacker, Peter; Mattii, Luca; Raghavan, Praveen; Gerousis, V.; Verkest, Diederik; Mocuta, Anda; Kim, Ryan Ryoung han; Spessot, Alessio; Ryckaert, Julien
Conference
Design-Process-Technology Co-optimization for Manufacturability XII
Title
Track height reduction for standard-cell in below 5nm node: How low can you go?
Publication type
Meeting abstract
Embargo date
9999-12-31
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