Antenna test structure matrix description, application for optimized HDP oxide deposition, metal etch, Ar preclean and passivation processing in sub-half micron CMOS processing
| dc.contributor.author | Ackaert, J. | |
| dc.contributor.author | de Backer, E. | |
| dc.contributor.author | Coppens, P. | |
| dc.contributor.author | Creusen, Martin | |
| dc.date.accessioned | 2021-10-06T10:40:51Z | |
| dc.date.available | 2021-10-06T10:40:51Z | |
| dc.date.issued | 1999 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3178 | |
| dc.source | IIOimport | |
| dc.title | Antenna test structure matrix description, application for optimized HDP oxide deposition, metal etch, Ar preclean and passivation processing in sub-half micron CMOS processing | |
| dc.type | Oral presentation | |
| dc.source.peerreview | no | |
| dc.source.conference | 1st European Symposium on Plasma Process Induced Damage (ESPID'1); 25-26 November 1999; Toulouse, France. | |
| imec.availability | Published - imec |
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