Authors

Ronse, Kurt; Pforr, Rainer; Baik, Ki-Ho; Jonckheere, Rik; Van den hove, Luc

Conference

Optical/Laser Microlithography VII

Title

Optimization of the optical phase shift in attenuated PSM and application to quarter micron deep-UV lithography for logics

Publication type

Proceedings paper

Embargo date

9999-12-31