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Insight in growth mechanism of Ru ALD on dielectrics

dc.contributor.authorSoethoudt, Job
dc.contributor.authorTomczak, Yoann
dc.contributor.authorGrillo, Fabio
dc.contributor.authorHody, Hubert
dc.contributor.authorMarques, Esteban
dc.contributor.authorVan Ommen, Ruud
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2021-10-26T04:24:45Z
dc.date.available2021-10-26T04:24:45Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31830
dc.sourceIIOimport
dc.titleInsight in growth mechanism of Ru ALD on dielectrics
dc.typeMeeting abstract
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorTomczak, Yoann
dc.contributor.imecauthorHody, Hubert
dc.contributor.imecauthorMarques, Esteban
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorDelabie, Annelies
dc.source.peerreviewno
dc.source.conference18th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate29/07/2018
dc.source.conferencelocationIncheon South Korea
imec.availabilityPublished - imec


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