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Diffusion-mediated nucleation behaviour of ruthenium atomic layer deposition on dielectrics

dc.contributor.authorSoethoudt, Job
dc.contributor.authorTomczak, Yoann
dc.contributor.authorGrillo, Fabio
dc.contributor.authorVan Ommen, Ruud
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2021-10-26T04:25:23Z
dc.date.available2021-10-26T04:25:23Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31831
dc.sourceIIOimport
dc.titleDiffusion-mediated nucleation behaviour of ruthenium atomic layer deposition on dielectrics
dc.typeMeeting abstract
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorTomczak, Yoann
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorDelabie, Annelies
dc.source.peerreviewno
dc.source.conferenceArea Selective Deposition Workshop - ASD
dc.source.conferencedate29/04/2018
dc.source.conferencelocationRaleigh, NC USA
imec.availabilityPublished - imec


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