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Scaling trends toward N3 and beyond: Device architecture and standard cells innovation impact on patterning and layout
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Scaling trends toward N3 and beyond: Device architecture and standard cells innovation impact on patterning and layout
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Date
2018-06
Proceedings Paper
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38988.pdf
4.35 MB
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Spessot, Alessio
Journal
Abstract
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1839
since deposited on 2021-10-26
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Acq. date: 2025-12-18
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Metrics
Views
1839
since deposited on 2021-10-26
1
last month
Acq. date: 2025-12-18
Citations