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Comparative stochastic process variation bands for N7, N5, and N3 at EUV

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGraves, Trey
dc.contributor.authorBlankenship, David
dc.contributor.authorBai, Kunlun
dc.contributor.authorRobertson, Stewart
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorBiafore, J.
dc.date.accessioned2021-10-26T06:14:20Z
dc.date.available2021-10-26T06:14:20Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31997
dc.sourceIIOimport
dc.titleComparative stochastic process variation bands for N7, N5, and N3 at EUV
dc.typeProceedings paper
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorDe Bisschop, Peter
dc.source.peerreviewyes
dc.source.beginpage105830K
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IX
dc.source.conferencedate12/02/2018
dc.source.conferencelocationSan Jose USA
dc.identifier.urlhttps://doi.org/10.1117/12.2299825
imec.availabilityPublished - imec
imec.internalnotesProceedings Volume 10583


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