Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Reliability in stacked Gate-All-Around Si nanowire devices: time dependent variability and full degradation mapping
Publication:
Reliability in stacked Gate-All-Around Si nanowire devices: time dependent variability and full degradation mapping
Copy permalink
Date
2018
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vaisman Chasin, Adrian
;
Bury, Erik
;
Franco, Jacopo
;
Kaczer, Ben
;
Rzepa, Gerhard
;
Putcha, Vamsi
;
Weckx, Pieter
;
Ritzenthaler, Romain
;
Mertens, Hans
;
Horiguchi, Naoto
;
Linten, Dimitri
Journal
Abstract
Description
Metrics
Views
1833
since deposited on 2021-10-26
Acq. date: 2026-01-08
Citations
Metrics
Views
1833
since deposited on 2021-10-26
Acq. date: 2026-01-08
Citations