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Reliability in stacked Gate-All-Around Si nanowire devices: time dependent variability and full degradation mapping

dc.contributor.authorVaisman Chasin, Adrian
dc.contributor.authorBury, Erik
dc.contributor.authorFranco, Jacopo
dc.contributor.authorKaczer, Ben
dc.contributor.authorRzepa, Gerhard
dc.contributor.authorPutcha, Vamsi
dc.contributor.authorWeckx, Pieter
dc.contributor.authorRitzenthaler, Romain
dc.contributor.authorMertens, Hans
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorLinten, Dimitri
dc.date.accessioned2021-10-26T06:15:08Z
dc.date.available2021-10-26T06:15:08Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31998
dc.sourceIIOimport
dc.titleReliability in stacked Gate-All-Around Si nanowire devices: time dependent variability and full degradation mapping
dc.typeProceedings paper
dc.contributor.imecauthorVaisman Chasin, Adrian
dc.contributor.imecauthorBury, Erik
dc.contributor.imecauthorFranco, Jacopo
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorPutcha, Vamsi
dc.contributor.imecauthorWeckx, Pieter
dc.contributor.imecauthorRitzenthaler, Romain
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorLinten, Dimitri
dc.contributor.orcidimecVaisman Chasin, Adrian::0000-0002-9940-0260
dc.contributor.orcidimecBury, Erik::0000-0002-5847-3949
dc.contributor.orcidimecFranco, Jacopo::0000-0002-7382-8605
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecPutcha, Vamsi::0000-0003-1907-5486
dc.contributor.orcidimecRitzenthaler, Romain::0000-0002-8615-3272
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecLinten, Dimitri::0000-0001-8434-1838
dc.source.peerreviewyes
dc.source.conferenceTaiwan ESD and Reliability Conference (TESDC-2018)
dc.source.conferencedate7/11/2018
dc.source.conferencelocationHsinchu Taiwan
imec.availabilityPublished - imec


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