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Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution

dc.contributor.authorvan Haren, Richard
dc.contributor.authorSteinert, Steffen
dc.contributor.authorMouraille, Orion
dc.contributor.authorD'have, Koen
dc.contributor.authorvan Dijk, Leon
dc.contributor.authorOtten, Ronald
dc.contributor.authorBeyer, Dirk
dc.date.accessioned2021-10-26T06:56:15Z
dc.date.available2021-10-26T06:56:15Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32058
dc.sourceIIOimport
dc.titleIntra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution
dc.typeProceedings paper
dc.contributor.imecauthorvan Haren, Richard
dc.contributor.imecauthorD'have, Koen
dc.contributor.orcidimecD'have, Koen::0000-0002-5195-9241
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage108070K
dc.source.conferencePhotomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
dc.source.conferencedate18/04/2018
dc.source.conferencelocationYokohama Japan
dc.identifier.urlhttps://doi.org/10.1117/12.2500086
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10807


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