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Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300

dc.contributor.authorVan Look, Lieve
dc.contributor.authorBekaert, Joost
dc.contributor.authorFrommhold, Andreas
dc.contributor.authorHendrickx, Eric
dc.contributor.authorRispens, Gijsbert
dc.contributor.authorSchiffelers, Guido
dc.date.accessioned2021-10-26T07:13:35Z
dc.date.available2021-10-26T07:13:35Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32084
dc.sourceIIOimport
dc.titleOptimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300
dc.typeProceedings paper
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorFrommhold, Andreas
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorRispens, Gijsbert
dc.contributor.imecauthorSchiffelers, Guido
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecFrommhold, Andreas::0000-0001-6824-5643
dc.source.peerreviewyes
dc.source.beginpage108090M
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedate17/09/2018
dc.source.conferencelocationMonterey, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2501797
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol.10809


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