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Dry removal of a surface functionalization chemistry used for pattern collapse prevention

dc.contributor.authorVereecke, Guy
dc.contributor.authorKomori, Kana
dc.contributor.authorNakano, Yuta
dc.contributor.authorSebaai, Farid
dc.contributor.authorXu, XiuMei
dc.contributor.authorOniki, Yusuke
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-26T08:25:42Z
dc.date.available2021-10-26T08:25:42Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32186
dc.sourceIIOimport
dc.titleDry removal of a surface functionalization chemistry used for pattern collapse prevention
dc.typeMeeting abstract
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorXu, XiuMei
dc.contributor.imecauthorOniki, Yusuke
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecXu, XiuMei::0000-0002-3356-8693
dc.contributor.orcidimecOniki, Yusuke::0000-0002-6619-1327
dc.source.peerreviewyes
dc.source.conferenceSurface Preparation & Cleaning Conference - SPCC
dc.source.conferencedate10/04/2018
dc.source.conferencelocationCambridge, MA USA
imec.availabilityPublished - imec


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