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Multi-trigger resist patterning with ASML NXE3300 EUV scanner

dc.contributor.authorVesters, Yannick
dc.contributor.authorMcClelland, Alexandra
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorPopescu, Carmen
dc.contributor.authorDawson, Guy
dc.contributor.authorRoth, John
dc.contributor.authorTheis, Wolfgang
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRobinson, Alex P. G.
dc.date.accessioned2021-10-26T08:44:17Z
dc.date.available2021-10-26T08:44:17Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32211
dc.sourceIIOimport
dc.titleMulti-trigger resist patterning with ASML NXE3300 EUV scanner
dc.typeProceedings paper
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorPopescu, Carmen
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1058308
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IX
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2297402
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10583


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