Authors

Wostyn, Kurt; Crovato, Nicola; Blancher, Ken; Van Bortel, Thomas; Kimura, Yosuke; Mertens, Hans; Vaisman Chasin, Adrian; Conard, Thierry; Douhard, Bastien; Meersschaut, Johan; Steenbergen, Johnny; Rondas, Dirk; Van Opstal, Tinneke; Hikavyy, Andriy; Milenin, Alexey; Loo, Roger; Holsteyns, Frank; Horiguchi, Naoto

Conference

9th International SiGe Technology and Device Meeting and 11th International Conference on Silicon Epitaxy and Heteros

Title

Selective oxidation of SiGe less than 50% versus Si using Low Temperature Steam Anneal at T less than or equal to 650°C

Publication type

Meeting abstract