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Selective oxidation of SiGe less than 50% versus Si using Low Temperature Steam Anneal at T less than or equal to 650°C

dc.contributor.authorWostyn, Kurt
dc.contributor.authorCrovato, Nicola
dc.contributor.authorBlancher, Ken
dc.contributor.authorVan Bortel, Thomas
dc.contributor.authorKimura, Yosuke
dc.contributor.authorMertens, Hans
dc.contributor.authorVaisman Chasin, Adrian
dc.contributor.authorConard, Thierry
dc.contributor.authorDouhard, Bastien
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorSteenbergen, Johnny
dc.contributor.authorRondas, Dirk
dc.contributor.authorVan Opstal, Tinneke
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorMilenin, Alexey
dc.contributor.authorLoo, Roger
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorHoriguchi, Naoto
dc.date.accessioned2021-10-26T09:33:42Z
dc.date.available2021-10-26T09:33:42Z
dc.date.issued2018-05
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32279
dc.sourceIIOimport
dc.titleSelective oxidation of SiGe less than 50% versus Si using Low Temperature Steam Anneal at T less than or equal to 650°C
dc.typeMeeting abstract
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorKimura, Yosuke
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorVaisman Chasin, Adrian
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorSteenbergen, Johnny
dc.contributor.imecauthorRondas, Dirk
dc.contributor.imecauthorVan Opstal, Tinneke
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.contributor.orcidimecVaisman Chasin, Adrian::0000-0002-9940-0260
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecKimura, Yosuke::0000-0002-9098-0414
dc.source.peerreviewyes
dc.source.conference9th International SiGe Technology and Device Meeting and 11th International Conference on Silicon Epitaxy and Heteros
dc.source.conferencedate27/05/2018
dc.source.conferencelocationPotsdam Germany
imec.availabilityPublished - imec


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