dc.contributor.author | Wostyn, Kurt | |
dc.contributor.author | Kenis, Karine | |
dc.contributor.author | Mertens, Hans | |
dc.contributor.author | Vaisman Chasin, Adrian | |
dc.contributor.author | Hikavyy, Andriy | |
dc.contributor.author | Holsteyns, Frank | |
dc.contributor.author | Horiguchi, Naoto | |
dc.date.accessioned | 2021-10-26T09:35:19Z | |
dc.date.available | 2021-10-26T09:35:19Z | |
dc.date.issued | 2018 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/32281 | |
dc.source | IIOimport | |
dc.title | Low temperature SiGe steam oxide – aqueous HF and NH3/NF3 remote plasma etching and its implementation as Si GAA inner spacer | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Wostyn, Kurt | |
dc.contributor.imecauthor | Kenis, Karine | |
dc.contributor.imecauthor | Mertens, Hans | |
dc.contributor.imecauthor | Vaisman Chasin, Adrian | |
dc.contributor.imecauthor | Hikavyy, Andriy | |
dc.contributor.imecauthor | Holsteyns, Frank | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.orcidimec | Wostyn, Kurt::0000-0003-3995-0292 | |
dc.contributor.orcidimec | Vaisman Chasin, Adrian::0000-0002-9940-0260 | |
dc.contributor.orcidimec | Hikavyy, Andriy::0000-0002-8201-075X | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 126 | |
dc.source.endpage | 131 | |
dc.source.conference | Ultra Clean Processing of Semiconductor Surfaces XIV - UCPSS | |
dc.source.conferencedate | 2/09/2018 | |
dc.source.conferencelocation | Leuven Belgium | |
dc.identifier.url | https://www.scientific.net/SSP.282.126 | |
imec.availability | Published - imec | |
imec.internalnotes | Solid State Phenomena; Vol. 282 | |