dc.contributor.author | Yu, Hao | |
dc.contributor.author | Schaekers, Marc | |
dc.contributor.author | Chew, Soon Aik | |
dc.contributor.author | Everaert, Jean-Luc | |
dc.contributor.author | Dabral, Ashish | |
dc.contributor.author | Pourtois, Geoffrey | |
dc.contributor.author | Horiguchi, Naoto | |
dc.contributor.author | Mocuta, Dan | |
dc.contributor.author | Collaert, Nadine | |
dc.contributor.author | De Meyer, Kristin | |
dc.date.accessioned | 2021-10-26T10:20:36Z | |
dc.date.available | 2021-10-26T10:20:36Z | |
dc.date.issued | 2018 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/32342 | |
dc.source | IIOimport | |
dc.title | Titanium (germano-)silicides featuring 10-9 $Xcm2 contact resistivity and improved compatibility to advanced CMOS technology | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Yu, Hao | |
dc.contributor.imecauthor | Schaekers, Marc | |
dc.contributor.imecauthor | Everaert, Jean-Luc | |
dc.contributor.imecauthor | Dabral, Ashish | |
dc.contributor.imecauthor | Pourtois, Geoffrey | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.imecauthor | Collaert, Nadine | |
dc.contributor.imecauthor | De Meyer, Kristin | |
dc.contributor.orcidimec | Yu, Hao::0000-0002-1976-0259 | |
dc.contributor.orcidimec | Schaekers, Marc::0000-0002-1496-7816 | |
dc.contributor.orcidimec | Pourtois, Geoffrey::0000-0003-2597-8534 | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.contributor.orcidimec | Collaert, Nadine::0000-0002-8062-3165 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1 | |
dc.source.endpage | 5 | |
dc.source.conference | 18th International Workshop on Junction Technology - IWJT | |
dc.source.conferencedate | 8/03/2018 | |
dc.source.conferencelocation | Shanghai China | |
dc.identifier.url | https://ieeexplore.ieee.org/document/8330298/ | |
imec.availability | Published - open access | |