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dc.contributor.authorYu, Hao
dc.contributor.authorSchaekers, Marc
dc.contributor.authorChew, Soon Aik
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorDabral, Ashish
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorMocuta, Dan
dc.contributor.authorCollaert, Nadine
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-26T10:20:36Z
dc.date.available2021-10-26T10:20:36Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32342
dc.sourceIIOimport
dc.titleTitanium (germano-)silicides featuring 10-9 $Xcm2 contact resistivity and improved compatibility to advanced CMOS technology
dc.typeProceedings paper
dc.contributor.imecauthorYu, Hao
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorDabral, Ashish
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecYu, Hao::0000-0002-1976-0259
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1
dc.source.endpage5
dc.source.conference18th International Workshop on Junction Technology - IWJT
dc.source.conferencedate8/03/2018
dc.source.conferencelocationShanghai China
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8330298/
imec.availabilityPublished - open access


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