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Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond

dc.contributor.authorBaudot, Sylvain
dc.contributor.authorSoussou, Assawer
dc.contributor.authorMilenin, Alexey
dc.contributor.authorHopf, Toby
dc.contributor.authorWang, Shouhua
dc.contributor.authorWeckx, Pieter
dc.contributor.authorVincent, Benjamin
dc.contributor.authorErvin, Joe
dc.contributor.authorDemuynck, Steven
dc.date.accessioned2021-10-27T07:30:35Z
dc.date.available2021-10-27T07:30:35Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32502
dc.sourceIIOimport
dc.titleSelf-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond
dc.typeProceedings paper
dc.contributor.imecauthorBaudot, Sylvain
dc.contributor.imecauthorSoussou, Assawer
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorHopf, Toby
dc.contributor.imecauthorWang, Shouhua
dc.contributor.imecauthorWeckx, Pieter
dc.contributor.imecauthorVincent, Benjamin
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecWang, Shouhua::0000-0002-9105-8552
dc.source.peerreviewyes
dc.source.beginpage109600N
dc.source.conferenceAdvances in Patterning Materials and Processes XXXVI
dc.source.conferencedate24/02/2019
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2514927
imec.availabilityPublished - imec
imec.internalnotesProceeedings of SPIE; Vol. 10960 Also published as White Paper : https://www.coventor.com/paper/self-aligned-fin-cut-last-patterning-scheme-for-fin-arrays-of-24nm-pitch-and-beyond/


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