Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond

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Authors
Baudot, Sylvain; Soussou, Assawer; Milenin, Alexey; Hopf, Toby; Wang, Shouhua; Weckx, Pieter; Vincent, Benjamin; Ervin, Joe; Demuynck, Steven
Conference
Advances in Patterning Materials and Processes XXXVI
Title
Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond
Publication type
Proceedings paper
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