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Conference contributions
Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond
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Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond
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Date
2019
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Baudot, Sylvain
;
Soussou, Assawer
;
Milenin, Alexey
;
Hopf, Toby
;
Wang, Shouhua
;
Weckx, Pieter
;
Vincent, Benjamin
;
Ervin, Joe
;
Demuynck, Steven
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1969
since deposited on 2021-10-27
Acq. date: 2025-12-16
Citations
Metrics
Views
1969
since deposited on 2021-10-27
Acq. date: 2025-12-16
Citations