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Predicting yield of photonic circuits with wafer-scale fabrication variability

dc.contributor.authorBogaerts, Wim
dc.contributor.authorXing, Yufei
dc.contributor.authorYe, Yinghao
dc.contributor.authorKhan, Muhammad Umar
dc.contributor.authorDong, Yiaxing
dc.contributor.authorGeessels, Joris
dc.contributor.authorFiers, Martin
dc.contributor.authorSpina, Domenico
dc.contributor.authorDhaene, Tom
dc.date.accessioned2021-10-27T07:39:51Z
dc.date.available2021-10-27T07:39:51Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32582
dc.sourceIIOimport
dc.titlePredicting yield of photonic circuits with wafer-scale fabrication variability
dc.typeProceedings paper
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorKhan, Muhammad Umar
dc.contributor.imecauthorSpina, Domenico
dc.contributor.imecauthorDhaene, Tom
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.contributor.orcidimecKhan, Muhammad Umar::0000-0001-5760-7485
dc.contributor.orcidimecSpina, Domenico::0000-0003-2379-5259
dc.contributor.orcidimecDhaene, Tom::0000-0003-2899-4636
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conference2019 IEEE MTT-S International Conference on Numerical Electromagnetic and Multiphysics Modeling and Optimization (NEMO)
dc.source.conferencedate29/05/2019
dc.source.conferencelocationBoston, MA USA
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8853660
imec.availabilityPublished - open access
imec.internalnotesISBN 978-1-5386-9517-3


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