Publication:
Post metal etch polymer removal: an investigation of the cleaning to remove residual of Si-C and Si-F after fluorocarbon plama etch on the silicon surface
Date
Loading...
Files
Journal
Abstract
Description
Statistics
Views
2003 since deposited on 2021-10-06
1last month
Acq. date: 2026-02-26
Citations
Statistics
Views
2003 since deposited on 2021-10-06
1last month
Acq. date: 2026-02-26
Citations