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Etch challenges on single and dual SOI fins patterning for CFET at 25nm fin pitch

dc.contributor.authorChan, BT
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorRyckaert, Julien
dc.contributor.authorZhang, Liping
dc.contributor.authorTao, Zheng
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorde Marneffe, Jean-Francois
dc.date.accessioned2021-10-27T07:57:22Z
dc.date.available2021-10-27T07:57:22Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32683
dc.sourceIIOimport
dc.titleEtch challenges on single and dual SOI fins patterning for CFET at 25nm fin pitch
dc.typeOral presentation
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.source.peerreviewno
dc.source.conference45th Micro and Nano Engineering (MNE) Conference
dc.source.conferencedate23/09/2019
dc.source.conferencelocationRhodes Greece
imec.availabilityPublished - imec


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