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dc.contributor.authorCiofi, Ivan
dc.contributor.authorRoussel, Philippe
dc.contributor.authorSaad, Yves
dc.contributor.authorMelvin, Lawrence
dc.contributor.authorWilson, Chris
dc.contributor.authorCroes, Kristof
dc.date.accessioned2021-10-27T08:04:15Z
dc.date.available2021-10-27T08:04:15Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32715
dc.sourceIIOimport
dc.titleCalibrated Modeling of Line-to-Line Dielectric Reliability: LER Specs to Meet Reliability Constraints at Operating Conditions
dc.typeMeeting abstract
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorCroes, Kristof
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage50
dc.source.conference26th Lithography Workshop
dc.source.conferencedate3/11/2019
dc.source.conferencelocationLa Quinta, CA USA
dc.identifier.urlhttps://www.lithoworkshop.org/assets/2019/2019-Litho-Workshop-Program-Book-v1.2.pdf
imec.availabilityPublished - open access


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