dc.contributor.author | Ciofi, Ivan | |
dc.contributor.author | Roussel, Philippe | |
dc.contributor.author | Saad, Yves | |
dc.contributor.author | Melvin, Lawrence | |
dc.contributor.author | Wilson, Chris | |
dc.contributor.author | Croes, Kristof | |
dc.date.accessioned | 2021-10-27T08:04:15Z | |
dc.date.available | 2021-10-27T08:04:15Z | |
dc.date.issued | 2019 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/32715 | |
dc.source | IIOimport | |
dc.title | Calibrated Modeling of Line-to-Line Dielectric Reliability: LER Specs to Meet Reliability Constraints at Operating Conditions | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Ciofi, Ivan | |
dc.contributor.imecauthor | Roussel, Philippe | |
dc.contributor.imecauthor | Wilson, Chris | |
dc.contributor.imecauthor | Croes, Kristof | |
dc.contributor.orcidimec | Ciofi, Ivan::0000-0003-1374-4116 | |
dc.contributor.orcidimec | Roussel, Philippe::0000-0002-0402-8225 | |
dc.contributor.orcidimec | Croes, Kristof::0000-0002-3955-0638 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 50 | |
dc.source.conference | 26th Lithography Workshop | |
dc.source.conferencedate | 3/11/2019 | |
dc.source.conferencelocation | La Quinta, CA USA | |
dc.identifier.url | https://www.lithoworkshop.org/assets/2019/2019-Litho-Workshop-Program-Book-v1.2.pdf | |
imec.availability | Published - open access | |