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Use of a thermally degradable chemical vapor deposited polymer film for low damage plasma processing of highly porous dielectrics
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Authors
de Marneffe, Jean-Francois
;
Yamaguchi, Tatsuya
;
Fujikawa, Makoto
;
Rezvanov, Askar
;
Chanson, Romain
;
Zhang, Jianran
;
Babaei Gavan, Khashayar
;
El Otell, Ziad
;
Nozawa, S.
;
Kikuchi, Y.
;
Maekawa, Kaoru
ISSN
2637-6113
Issue
12
Journal
ACS Applied Electronic Materials
Volume
1
Title
Use of a thermally degradable chemical vapor deposited polymer film for low damage plasma processing of highly porous dielectrics
Publication type
Journal article
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