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Staggered pillar patterning using 0.33NA EUV lithography

dc.contributor.authorDe Simone, Danilo
dc.contributor.authorBlanc, Romuald
dc.contributor.authorVan de Kerkhove, Jeroen
dc.contributor.authorTamaddon, Amir-Hossein
dc.contributor.authorFallica, Roberto
dc.contributor.authorVan Look, Lieve
dc.contributor.authorRassoul, Nouredine
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorVanelderen, Pieter
dc.contributor.authorLorusso, Gian
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRonse, Kurt
dc.contributor.authorLee, Kilyoung
dc.contributor.authorLee, Junghyung
dc.contributor.authorPark, Sarohan
dc.contributor.authorLim, Chang-Moon
dc.contributor.authorPark, Chan-Ha
dc.date.accessioned2021-10-27T08:33:33Z
dc.date.available2021-10-27T08:33:33Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32835
dc.sourceIIOimport
dc.titleStaggered pillar patterning using 0.33NA EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorBlanc, Romuald
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.contributor.imecauthorTamaddon, Amir-Hossein
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorRassoul, Nouredine
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorVanelderen, Pieter
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecTamaddon, Amir-Hossein::0000-0003-4566-0697
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecRassoul, Nouredine::0000-0001-9489-3396
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewyes
dc.source.beginpage109570T-1
dc.source.endpage109570T-10
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography X
dc.source.conferencedate25/02/2019
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2515170
imec.availabilityPublished - imec
imec.internalnotesSPIE Proceedings; Vol.10957


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