dc.contributor.author | Eyben, Pierre | |
dc.contributor.author | Ritzenthaler, Romain | |
dc.contributor.author | De Keersgieter, An | |
dc.contributor.author | Chiarella, Thomas | |
dc.contributor.author | Veloso, Anabela | |
dc.contributor.author | Mertens, Hans | |
dc.contributor.author | Pena, Vanessa | |
dc.contributor.author | Santoro, Gaetano | |
dc.contributor.author | Machillot, Jerome | |
dc.contributor.author | Kim, Myungsun | |
dc.contributor.author | Miyashita, Toshihiko | |
dc.contributor.author | Yoshida, Naomi | |
dc.contributor.author | Bender, Hugo | |
dc.contributor.author | Richard, Olivier | |
dc.contributor.author | Celano, Umberto | |
dc.contributor.author | Paredis, Kristof | |
dc.contributor.author | Wouters, Lennaert | |
dc.contributor.author | Mitard, Jerome | |
dc.contributor.author | Horiguchi, Naoto | |
dc.date.accessioned | 2021-10-27T09:06:35Z | |
dc.date.available | 2021-10-27T09:06:35Z | |
dc.date.issued | 2019 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/32943 | |
dc.source | IIOimport | |
dc.title | 3D-carrier profiling and parasitic resistance analysis in vertically stacked gate-all-around Si nanowire CMOS transistors | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Eyben, Pierre | |
dc.contributor.imecauthor | Ritzenthaler, Romain | |
dc.contributor.imecauthor | De Keersgieter, An | |
dc.contributor.imecauthor | Chiarella, Thomas | |
dc.contributor.imecauthor | Veloso, Anabela | |
dc.contributor.imecauthor | Mertens, Hans | |
dc.contributor.imecauthor | Pena, Vanessa | |
dc.contributor.imecauthor | Santoro, Gaetano | |
dc.contributor.imecauthor | Machillot, Jerome | |
dc.contributor.imecauthor | Bender, Hugo | |
dc.contributor.imecauthor | Richard, Olivier | |
dc.contributor.imecauthor | Celano, Umberto | |
dc.contributor.imecauthor | Paredis, Kristof | |
dc.contributor.imecauthor | Wouters, Lennaert | |
dc.contributor.imecauthor | Mitard, Jerome | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.orcidimec | Ritzenthaler, Romain::0000-0002-8615-3272 | |
dc.contributor.orcidimec | De Keersgieter, An::0000-0002-5527-8582 | |
dc.contributor.orcidimec | Chiarella, Thomas::0000-0002-6155-9030 | |
dc.contributor.orcidimec | Richard, Olivier::0000-0002-3994-8021 | |
dc.contributor.orcidimec | Celano, Umberto::0000-0002-2856-3847 | |
dc.contributor.orcidimec | Paredis, Kristof::0000-0002-5163-4164 | |
dc.contributor.orcidimec | Wouters, Lennaert::0000-0002-6730-9542 | |
dc.contributor.orcidimec | Mitard, Jerome::0000-0002-7422-079X | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 238 | |
dc.source.endpage | 241 | |
dc.source.conference | IEEE International Electron Devices Meeting - IEDM 2019 | |
dc.source.conferencedate | 7/12/2019 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - open access | |