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3D-carrier profiling and parasitic resistance analysis in vertically stacked gate-all-around Si nanowire CMOS transistors

dc.contributor.authorEyben, Pierre
dc.contributor.authorRitzenthaler, Romain
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorChiarella, Thomas
dc.contributor.authorVeloso, Anabela
dc.contributor.authorMertens, Hans
dc.contributor.authorPena, Vanessa
dc.contributor.authorSantoro, Gaetano
dc.contributor.authorMachillot, Jerome
dc.contributor.authorKim, Myungsun
dc.contributor.authorMiyashita, Toshihiko
dc.contributor.authorYoshida, Naomi
dc.contributor.authorBender, Hugo
dc.contributor.authorRichard, Olivier
dc.contributor.authorCelano, Umberto
dc.contributor.authorParedis, Kristof
dc.contributor.authorWouters, Lennaert
dc.contributor.authorMitard, Jerome
dc.contributor.authorHoriguchi, Naoto
dc.date.accessioned2021-10-27T09:06:35Z
dc.date.available2021-10-27T09:06:35Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32943
dc.sourceIIOimport
dc.title3D-carrier profiling and parasitic resistance analysis in vertically stacked gate-all-around Si nanowire CMOS transistors
dc.typeProceedings paper
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorRitzenthaler, Romain
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorPena, Vanessa
dc.contributor.imecauthorSantoro, Gaetano
dc.contributor.imecauthorMachillot, Jerome
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorCelano, Umberto
dc.contributor.imecauthorParedis, Kristof
dc.contributor.imecauthorWouters, Lennaert
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecRitzenthaler, Romain::0000-0002-8615-3272
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecCelano, Umberto::0000-0002-2856-3847
dc.contributor.orcidimecParedis, Kristof::0000-0002-5163-4164
dc.contributor.orcidimecWouters, Lennaert::0000-0002-6730-9542
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage238
dc.source.endpage241
dc.source.conferenceIEEE International Electron Devices Meeting - IEDM 2019
dc.source.conferencedate7/12/2019
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access


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