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Improving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrations

dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorBekaert, Joost
dc.contributor.authorBlanco, Victor
dc.contributor.authorVan Look, Lieve
dc.contributor.authorWahlisch, Felix
dc.contributor.authorLyakhova, Kateryna
dc.contributor.authorVan Adrichem, Paul
dc.contributor.authorMaslow, Mark John
dc.contributor.authorSchiffelers, Guido
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-27T09:19:07Z
dc.date.available2021-10-27T09:19:07Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32979
dc.sourceIIOimport
dc.titleImproving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrations
dc.typeProceedings paper
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorLyakhova, Kateryna
dc.contributor.imecauthorVan Adrichem, Paul
dc.contributor.imecauthorSchiffelers, Guido
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.source.peerreviewyes
dc.source.beginpage111470E
dc.source.conferenceInternational conference on Extreme Ultraviolet Lithography
dc.source.conferencedate15/09/2019
dc.source.conferencelocationMonterey (CA) USA
dc.identifier.urlhttp://dx.doi.org/10.1117/12.2537104
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11147


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