Authors

Franke, Joern-Holger; Bekaert, Joost; Blanco, Victor; Van Look, Lieve; Wahlisch, Felix; Lyakhova, Kateryna; Van Adrichem, Paul; Maslow, Mark John; Schiffelers, Guido; Hendrickx, Eric

Conference

International conference on Extreme Ultraviolet Lithography

Title

Improving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrations

Publication type

Proceedings paper