Improving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrations

dc.contributor.author	Franke, Joern-Holger
dc.contributor.author	Bekaert, Joost
dc.contributor.author	Blanco, Victor
dc.contributor.author	Van Look, Lieve
dc.contributor.author	Wahlisch, Felix
dc.contributor.author	Lyakhova, Kateryna
dc.contributor.author	Van Adrichem, Paul
dc.contributor.author	Maslow, Mark John
dc.contributor.author	Schiffelers, Guido
dc.contributor.author	Hendrickx, Eric
dc.contributor.imecauthor	Franke, Joern-Holger
dc.contributor.imecauthor	Bekaert, Joost
dc.contributor.imecauthor	Blanco, Victor
dc.contributor.imecauthor	Van Look, Lieve
dc.contributor.imecauthor	Lyakhova, Kateryna
dc.contributor.imecauthor	Van Adrichem, Paul
dc.contributor.imecauthor	Schiffelers, Guido
dc.contributor.imecauthor	Hendrickx, Eric
dc.contributor.orcidimec	Franke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimec	Bekaert, Joost::0000-0003-3075-3479
dc.date.accessioned	2021-10-27T09:19:07Z
dc.date.available	2021-10-27T09:19:07Z
dc.date.issued	2019
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/32979
dc.identifier.url	http://dx.doi.org/10.1117/12.2537104
dc.source.beginpage	111470E
dc.source.conference	International conference on Extreme Ultraviolet Lithography
dc.source.conferencedate	15/09/2019
dc.source.conferencelocation	Monterey (CA) USA
dc.title	Improving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrations
dc.type	Proceedings paper
dspace.entity.type	Publication
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