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Improving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrations
Publication:
Improving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrations
Date
2019
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Franke, Joern-Holger
;
Bekaert, Joost
;
Blanco, Victor
;
Van Look, Lieve
;
Wahlisch, Felix
;
Lyakhova, Kateryna
;
Van Adrichem, Paul
;
Maslow, Mark John
;
Schiffelers, Guido
;
Hendrickx, Eric
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1976
since deposited on 2021-10-27
445
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations
Metrics
Views
1976
since deposited on 2021-10-27
445
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations