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Deep learning nanometrology of line edge roughness

dc.contributor.authorGiannatou, Eva
dc.contributor.authorConstantoudis, Vassilios
dc.contributor.authorPapavieros, George
dc.contributor.authorPapageorgiou, Harris
dc.contributor.authorRutigliani, Vito
dc.contributor.authorLorusso, Gian
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorGogolides, Evangelos
dc.date.accessioned2021-10-27T09:37:07Z
dc.date.available2021-10-27T09:37:07Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33028
dc.sourceIIOimport
dc.titleDeep learning nanometrology of line edge roughness
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorVan Roey, Frieda
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1095920
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIII
dc.source.conferencedate24/02/2019
dc.source.conferencelocationSan Jose, CA California
dc.identifier.urlhttps://doi.org/10.1117/12.2520941
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10959


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