Show simple item record

XPS study of the cleaning efficiency by ozone processes of protective films formed by reactive ion etching of Co and Ti silicides

dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVos, Rita
dc.contributor.authorHeyns, Marc
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-06T10:49:32Z
dc.date.available2021-10-06T10:49:32Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3310
dc.sourceIIOimport
dc.titleXPS study of the cleaning efficiency by ozone processes of protective films formed by reactive ion etching of Co and Ti silicides
dc.typeProceedings paper
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage139
dc.source.endpage142
dc.source.conferenceUltra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesHi, We have full text access to this one: see link on intranet (learning / electronic journals). Greet


Files in this item

Thumbnail
Name:
3275.pdf
Size:
288.9Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record