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Comparative analysis of the degradation mechanisms in logic and I/O FinFET devices induced by plasma damage

dc.contributor.authorHiblot, Gaspard
dc.contributor.authorLiu, Yefan
dc.contributor.authorHellings, Geert
dc.contributor.authorVan der Plas, Geert
dc.date.accessioned2021-10-27T10:27:26Z
dc.date.available2021-10-27T10:27:26Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33157
dc.sourceIIOimport
dc.titleComparative analysis of the degradation mechanisms in logic and I/O FinFET devices induced by plasma damage
dc.typeProceedings paper
dc.contributor.imecauthorHiblot, Gaspard
dc.contributor.imecauthorLiu, Yefan
dc.contributor.imecauthorHellings, Geert
dc.contributor.imecauthorVan der Plas, Geert
dc.contributor.orcidimecHiblot, Gaspard::0000-0002-3869-965X
dc.contributor.orcidimecHellings, Geert::0000-0002-5376-2119
dc.contributor.orcidimecVan der Plas, Geert::0000-0002-4975-6672
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1
dc.source.endpage5
dc.source.conference2019 IEEE International Reliability Physics Symposium (IRPS)
dc.source.conferencedate31/03/2019
dc.source.conferencelocationMonterey, CA USA
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8720525
imec.availabilityPublished - open access


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