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Evaluation of the accuracy and precision of STEM and EDS metrology on horizontal GAA nanowire devices

dc.contributor.authorJohanesen, Hayley
dc.contributor.authorStrauss, Michael
dc.contributor.authorKenslea, Anne
dc.contributor.authorHakala, Chris
dc.contributor.authorKwakman, Laurens
dc.contributor.authorBoullart, Werner
dc.contributor.authorMertens, Hans
dc.contributor.authorSiew, Yong Kong
dc.contributor.authorBarla, Kathy
dc.date.accessioned2021-10-27T10:59:05Z
dc.date.available2021-10-27T10:59:05Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33229
dc.sourceIIOimport
dc.titleEvaluation of the accuracy and precision of STEM and EDS metrology on horizontal GAA nanowire devices
dc.typeProceedings paper
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorSiew, Yong Kong
dc.contributor.imecauthorBarla, Kathy
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage109591C
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIII
dc.source.conferencedate24/12/2019
dc.source.conferencelocationSan Jose USA
dc.identifier.urlhttps://doi.org/10.1117/12.2514995
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10959


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