Stochastic printing behavior of ML-defects on EUV mask

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Authors
Jonckheere, Rik; Melvin, Lawrence; Capelli, Renzo
Conference
International Conference on Extreme Ultraviolet Lithography 2019
Title
Stochastic printing behavior of ML-defects on EUV mask
Publication type
Proceedings paper
Embargo date
9999-12-31
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