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Stochastic printing behavior of ML-defects on EUV mask

dc.contributor.authorJonckheere, Rik
dc.contributor.authorMelvin, Lawrence
dc.contributor.authorCapelli, Renzo
dc.date.accessioned2021-10-27T10:59:29Z
dc.date.available2021-10-27T10:59:29Z
dc.date.issued2019-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33230
dc.sourceIIOimport
dc.titleStochastic printing behavior of ML-defects on EUV mask
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage111470P
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography 2019
dc.source.conferencedate16/09/2019
dc.source.conferencelocationMonterey, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2538153
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 11147


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